Czasopismo | INŻYNIERIA MATERIAŁOWA | Rocznik 2010 - zeszyt 3

Low friction MoS2(Ti, W) coatings deposited by magnetron sputtering

nr katalogowy: 52701

Self-lubrication of graphite or of some metal dichalcogenides (such as MoS2 or WS2) is a very desired property in many technical applications. The phenomenon of self-lubrication in these materials is a result of a very big anisotropy of the crystallographic structure of these materials. In case of the MoS2-based material the basal planes of MoS2 elementary cells consist of hexagonal, strong covalent- -bonded planes of metal atoms between two planes of sulfur atoms. In a perpendicular direction exist weak Van der Waals interactions between the neighbouring planes built from sulfur atoms, what brings about a low shear strength [1, 2]. Limitation of use of grease and oils in friction couples becomes more and more important due to difficulties with smearing at high loads and to high costs of recycling of used oils. Nowadays, coatings’ engineering is able to tailor the most outward areas of mating machine elements to working conditions. Coatings based on MoS2 have been largely used in numerous applications, such as, for example, ceramic tools for dry machining of stainless steel [3÷6], inserts for dry high speed milling of steel and grey cast iron [7, 8], ejector pins used for plastic moulds [4], punches for piercing and fine blanking of stainless steel [6], in a variety of engine components such as fuel injection systems, tappets, pistons, piston rings and bearings [5] and recently also as coatings for gears [9, 10] or for elements of friction simulator working in real space environment in a lunar orbiter [11]. On the other hand, pure MoS2 coatings exhibit relatively high wear during sliding in humid atmospheres or temperatures higher than 400÷500°C due to heavy oxidation [2]. Many attempts have been made to extend the range of convenient working conditions. Firstly, by incorporating different metals atoms into MoS2 matrix, as, for example: Au, Ni, Pb, Ti, Ta, Cr, Ce, Re, Mo, Cr, Zr, W, Si [2, 12÷14]. Secondly, by using comp[...]

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