Czasopismo | INŻYNIERIA MATERIAŁOWA | Rocznik 2016 - zeszyt 4

The liquid phosphorus source for Si solar cells fabrication

10.15199/28.2016.4.4

nr katalogowy: 100289
10.15199/28.2016.4.4

A new liquid source of phosphorus atoms (SPA), dedicated to emitter formation in Si solar cells, was elaborated on the basis of H3PO4. The important properties of this solution, that can be deposited by the spray method, make possible the formation of easily removable phosphosilicate glass (PSG) when the diffusion process is performed. The PSG formed from SPA and from conventional POCl3 source were investigated by X-ray photoelectron spectroscopy. The diffusion depth profiles were determined by a secondary ion mass spectrometry. The presented solution and technology of the n-type diffused layer formation allowed for precise shaping of the phosphorus doping profile. Relatively short diffusion process, which lasted only for 3 minutes, resulted in the sheet resistance between 30÷120 Ω/□, that is appropriate for the solar cells applications. The solar cells with the use of new donor source were produced and characterized by the current-voltage and spectral response techniques. The simple technology of the emitter fabrication from the liquid solution deposited by a spray method is expected to become more cost-competitive in major PV companies than the traditional POCl3 based technique. Key words: phosphorus diffusion, silicon solar cell.1. INTRODUCTION The market requirement for the crystalline Si (c-Si) solar cells production forces the cost reduction per unit power. This task can be achieved either by further enhancing the energy conversion efficiency or by lowering the fabrication costs that requires the development of new production methods. The crucial step in the manufacturing of the crystalline silicon solar cells is the emitter formation. The emitters can be formed using several techniques such as thermal method, spin-on, spray, screen-printing, chemical vapour deposition, epitaxy, evaporation, implantation or closed contact. There are two compounds industrially applied for phosphorus doping i.e. POCl3 liquid source and H3P[...]

Bibliografia

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